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eBeam Initiative Survey Indicates Rising Optimism in EUV Lithography and Multi-beam Technology for Photomask ProductionSAN JOSE, Calif., Sept. 29, 2015 /PRNewswire/ -- The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, today announced the completion of its fourth annual eBeam Initiative members' perceptions survey. A record 64 industry luminaries representing 35 different companies from across the semiconductor ecosystem—including chip design, equipment, materials and manufacturing as well as photomasks—participated in this year's survey. The eBeam Initiative also completed its first-ever merchant and captive mask makers' survey. In related news, ZEISS, a leading innovator in lithography optics for semiconductor manufacturing, has joined the eBeam Initiative. Among the results of the members' perception survey, respondents expressed increased optimism in the implementation of EUV lithography for semiconductor high-volume manufacturing (HVM) compared to last year's survey, while at the same time acknowledging that EUV lithography is expected to add greater complexity to photomask manufacturing. In addition, expectations on the use of multi-beam technology for advanced photomask manufacturing continue to remain strong. Results from the eBeam Initiative's first mask makers survey—which not only provides insight into the challenges and opportunities for photomask manufacturers but also gives mask makers a way to assess their own progress relative to their peers—indicate growing mask complexity across many fronts. The complete results of both surveys will be presented and discussed by an expert panel today during the eBeam Initiative's annual members meeting at the SPIE Photomask Technology Conference in Monterey, Calif., and are available for download at www.ebeam.org. Select Highlights from eBeam Initiative Member Survey
"eBeam technology is critical to enabling the continuation of Moore's Law, regardless of which lithography approach is used for semiconductor design and cost scaling," stated Dr. Markus Waiblinger, senior product manager, strategic business unit Semiconductor Metrology Systems of ZEISS. "As an innovator in the use of eBeam technology for optical and EUV mask inspection, review and repair solutions, ZEISS applauds the eBeam Initiative for educating the semiconductor supply chain about new developments in eBeam technology and for providing a forum for greater collaboration. Efforts like the annual members' survey and now their first mask makers' survey play an important role in fulfilling that charter, and we're pleased to have the opportunity to participate as a new member of the eBeam Initiative." "On behalf of the eBeam Initiative, I wish to thank all of our members—including our newest member ZEISS—for their participation in our fourth annual members' perception survey," stated Aki Fujimura, CEO of D2S, the managing company sponsor of the eBeam Initiative. "2015 has truly been an exciting year for the Initiative, as members of the eBeam community continue to step forward with new solutions to solve some of the semiconductor and photomask industry's most pressing manufacturing challenges. Interest and excitement in eBeam technology continues to grow, which is reflected in the record turnout of responses that we received for our annual survey, as well as the strong reception from the global mask community toward our inaugural mask makers' survey. Feedback from these surveys is invaluable in helping guide our education efforts within the eBeam supply chain, and we look forward to presenting our results for both surveys at the SPIE Photomask Conference later today." About The eBeam Initiative
To view the original version on PR Newswire, visit:http://www.prnewswire.com/news-releases/ebeam-initiative-survey-indicates-rising-optimism-in-euv-lithography-and-multi-beam-technology-for-photomask-production-300150701.html SOURCE eBeam Initiative |